
Création NLP STORE — thème Estampe Lunaire. Discover ultimate comfort with our polo, featuring ultra-fine flat back RacerMesh for exceptional breathability and cooling. Designed with PosiCharge technology, this shirt locks in vibrant colors and keeps logos looking sharp, making it a favorite for any season. Crafted from lightweight 3.8-ounce, 100% polyester flat back mesh, this polo ensures a comfortable, tag-free experience. Enjoy the benefits of moisture-wicking properties, a stylish flat knit collar, and a taped neck for a polished look. The classic 3-button placket with dyed-to-match buttons and the practical left chest pocket add functional elegance, while the set-in, open hem sleeves provide a relaxed fit. Perfect for work or play, this polo combines style and practicality seamlessly. .:Ultra-fine flat back RacerMesh for breathability .:PosiCharge technology for color retention .:100% polyester .:Tag-free label .:Moisture-wicking .:Flat knit collar .:Taped neck .:3-button placket with dyed-to-match buttons .:Left chest pocket .:Set-in, open hem sleeves
Fabriqué à la demande et livrable dans de nombreux pays. La disponibilité de la taille et du pays est vérifiée dans le panier avant le paiement.
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